1.

Conference Proceedings
Conference Proceedings
1. Resolution enhancement technology requirements for 65-nm node
Kroyan, A. ; Liu, H.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.305-313,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. Practical approach for AAPSM image imbalance correction for sub-100-nm lithography
Cho, H.L. ; Lin, S.Y. ; Hsieh, F. ; Kroyan, A. ; Liu, H.-Y. ; Huang, J.H. ; Hsu, S.-H. ; Huang, I-H. ; Lin, B.S.-M. ; Hung, K.-C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.778-786,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Effects of alternating aperture PSM design on image imbalance for 65-nm technology
Kroyan, A. ; Liu, H.-Y.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1217-1226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Image-blur tolerances for 65-nm and 45-nm node IC manufacturing
Lalovic, I. ; Kroyan, A. ; Kye, J. ; Liu, H.-Y. ; Levinson, H.J.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1570-1580,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Fast full-chip MEEF simulations for mask and wafer metrology
Tsai, C.-M. ; Liu, H,.-Y. ; Kroyan, A. ; Shen, N.-C. ; Wang, Y.-T.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.887-895,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. A new concept of image imbalance correction for phase-shift mask lithography at 65 nm
Kamat, V.G. ; Kroyan, A.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.834-841,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. Implementing AAPSM in 90-nm product with practical image imbalance correction
Lin, B.S. ; Hsu, S.- ; Huang, I.H. ; Chen, K. ; Hsieh, F. ; Hsu, T. ; Liu, H.-Y. ; Kroyan, A. ; Hsu, F. ; Huang, J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.103-111,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256