1.

Conference Proceedings
Conference Proceedings
1. Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
Lee, B. ; Hung, R. ; Lin, O. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Hsu, M. ; Hsu, S. D.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.114-121,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Technical Paper
Technical Paper
2. Characteristics and Performance of the Japanese Experimental Module (JEM) Air Ventilation.
Son, C.H. ; Aoki, I. ; Kozuma, M. ; Ito, S. ; Kohama, T.
Pub. info.: 33rd International Conference on Environmental Systems : SAE technical paper.  2003.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2003
3.

Conference Proceedings
Conference Proceedings
3. Non-chemical cleaning technology for sub-90nm design node photomask manufacturing [6349-106]
Hoyeh, S. ; Chen, R. ; Kozuma, M. ; Kuo, J. ; Huang, T. ; Chen, F. F.
Pub. info.: Photomask Technology 2006.  pp.63492U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
4.

Conference Proceedings
Conference Proceedings
4. Application of CPL mask for whole chip 5nm DRAM patterning [5853-69]
Lin, 0. ; Hung, R. ; Lee, B. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Lin, J. ; Hsu, M. ; Hsu, S. D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.835-843,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. Advanced e-beam CAR resist evaluation for 65nm generation [5992-112]
Chan, G. ; Lin, O. ; Tseng, W. ; Lee, B. ; Huang, T. ; Kozuma, M.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923B-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. New slit scan developer system for advanced 45-nm mask making [5853-21]
Wang, S. ; Miyazaki, S. ; Kozuma, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.438-444,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
7.

Conference Proceedings
Conference Proceedings
7. The effect between mask blank flatness and wafer print process window in ArF 6% att. PSM mask [6349-197]
Tzeng, J. ; Lee, B. ; Lu, J. ; Kozuma, M. ; Chen, N. ; Lin, W. K. ; Chung, A. ; Houng, Y. C. ; Wei, C. H.
Pub. info.: Photomask Technology 2006.  pp.634954-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349