1.

Conference Proceedings
Conference Proceedings
1. 23 Ni-based silicides: material issues for advanced CMOS applications
Kittl, J.A. ; Lauwers, A. ; Chamirian, O. ; Van Dal, M ; Akheyar, A. ; Richard, O. ; Lisoni, J.G. ; De Potter, M ; Lindsay, R. ; Moex, K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.177-182,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. 28 Self-aligned PtSi Fully Silicided (FUST) Metal Gates for 45 nm CMOS Applications
van Dal, M.J.H. ; Lauwers, A. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Demeurisse, C. ; Dao, T. ; Tamminga, Y. ; Veloso, A. ; Kittl, J.A. ; Maex, K.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.233-240,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. CONGRUENT MELTING TEMPERATURES OF Si-As ALLOYS MEASURED DURING PULSED-LASER MELTING AND RAPID SOLIDIFICATION
Kittl, J.A. ; Reitano, R. ; Aziz, M.J. ; Brunco, D.P. ; Thompson, M.O.
Pub. info.: Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.691-698,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 279