1.

Conference Proceedings
Conference Proceedings
1. Insertion effects of various acid sensitive groups into acetal type polymer on the profile of 248-nm chemically amplified resist
Chung, Y.-S. ; Kim, H.-J. ; Cho, S.-H. ; Lee, D.-H. ; Im, K.-H. ; Yim, Y.-G. ; Kim, D.-B. ; Kim, J.-Y.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.660-670,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Development of bottom antireflective coating for high-resolution KrF lithography
Kang, Y.-H. ; Oh, C.-I.. ; Song, S.-K. ; Kim, D.-B. ; Kim, J.-H.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1093-1101,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248-nm chemically amplified resist
Kim, H.-J. ; Chung, Y.-S. ; Lee, D.-H. ; Cho, S.-H. ; Im, K.-H. ; Yim, Y.-G. ; Kim, D.-B. ; Kim, J.Y.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.651-659,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)
Lee, G. ; Kong, K.-K. ; Jung, J.-C. ; Shin, K.-S. ; Kang, J.-H. ; Kim, S.D. ; Choi, Y.-J. ; Choi, S.-J. ; Kim, D.-B. ; Kim, J.-H.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.136-140,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
5.

Conference Proceedings
Conference Proceedings
5. Investigation on the role of residual casting solvent in photolithographic behavior in 193-nm resists
Kang, J.-H. ; Oh, S.-K. ; Son, E.-K. ; Kim, J.-W. ; Kim, Y.-H. ; Choi, Y.-J. ; Kim, D.-B. ; Kim, J.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1052-1062,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039