1.

Conference Proceedings
Conference Proceedings
1. Hard Amorphous Hydrogenated Carbon Films Deposited from an Expanding Thermal Plasma
Gielen, J. W. A. M. ; Sanden, M. C. M. van de ; Kessels, W. M. M. ; Schram, D. C.
Pub. info.: Thin films, stresses and mechanical properties VI : symposium held April 8-12, 1996, San Francisco, California, U.S.A..  pp.287-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 436
2.

Conference Proceedings
Conference Proceedings
2. Hydrogen in a-Si:H Deposited by an Expanding Thermal Plasma: A Temperature, Growth Rate and Isotope Study
Kessels, W. M. M. ; Sanden, M. C. M. van de ; Severens, R. J. ; Ijzendoorn, L. J. van ; Schram, D. C.
Pub. info.: Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A..  pp.529-,  1999.  Warrendale.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 507
3.

Conference Proceedings
Conference Proceedings
3. On the Role of Surface Diffusion and Its Relation to the Hydrogen Incorporation During Hydrogenated Amorphous Silicon Growth
Smets, A. H. M. ; Kessels, W. M. M. ; Sanden, M. C. M. van de
Pub. info.: Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, U.S.A..  pp.461-466,  2003.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 762
4.

Conference Proceedings
Conference Proceedings
4. The a-Si:H Growth Mechanism: Temperature Study of the SiH3 Surface Reactivity and the Surface Silicon Hydride Composition During Film Growth
Kessels, W. M. M. ; Barrell, Y. ; Oever, P. J. van den ; Hoefnagels, J. P. M. ; Sanden, M. C. M. van de
Pub. info.: Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, U.S.A..  pp.431-436,  2003.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 762
5.

Conference Proceedings
Conference Proceedings
5. High-Rate (＞ 1nm/s) and Low-Temperature (＜ 400℃) Deposition of Silicon Nitride Using an N2/SiH4 and NH3/SiH4 Expanding Thermal Plasma
Hong, J. ; Kessels, W. M. M. ; Sanden, M. C. M. van de
Pub. info.: Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, U.S.A..  pp.169-174,  2003.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 762
6.

Conference Proceedings
Conference Proceedings
6. Relation Between Growth Precursors And Film Properties For Plasma Deposition Of a-Si:H At Rates Up To 100 A/s
Boogaarts, M. G. H. ; Hoefhagels, J. P. M. ; Kessels, W. M. M. ; Schram, D. C. ; Smets, A. H. M. ; VandeSen, M. C. M.
Pub. info.: Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A..  pp.A4.2-,  2001.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 609
7.

Conference Proceedings
Conference Proceedings
7. Expanding thermal plasma CVD: Experimental studies of the plasma-surface interaction
Van de Sanden, M. C. M. ; Creatore, M. ; Blauw, M. A. ; Hoefiiagels, J. P. M. ; Hoex, B. ; van den Oever, P. J. ; Smets, A. H. M. ; Schram, D. C. ; Kessels, W. M. M.
Pub. info.: EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium.  pp.36-48,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-09
8.

Conference Proceedings
Conference Proceedings
8. The Role of H in the Growth Mechanism of PECVD a-Si:H
Kessels, W. M. M. ; Korevaar, B. A. ; Schram, D. C. ; Severens, R. J. ; Smets, A. H. M. ; vandeSen, M. C. M.
Pub. info.: Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A..  pp.13-18,  1999.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 557
9.

Conference Proceedings
Conference Proceedings
9. Expanding Thermal Plasma for Low-k Dielectrics Deposition
Creatore, M. ; Barrell, Y. ; Kessels, W. M. M. ; Sanden, M. C. M. van de
Pub. info.: Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2003 : symposium held April 21-25, 2003, San Francisco, California, U.S.A..  pp.339-344,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 766
10.

Conference Proceedings
Conference Proceedings
10. Thin Film Cavity Ringdown Spectroscopy and Second Harmonic Generation on Thin a-Si:H Films
Aarts, I. M. P. ; Hoex, B. ; Gielis, J. J. H. ; Leewis, C. M. ; Smets, A. H. M. ; Engeln, R. ; Nesladek, M. ; Kessels, W. M. M. ; Sanden, M. C. M. van de
Pub. info.: Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, U.S.A..  pp.111-116,  2003.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 762