1.

Technical Paper
Technical Paper
1. Development of an Engine Torque Estimation Model: Integration of Physical and Statistical Combustion Modes.
Katsumata, M. ; Kuroda, Y. ; Ohata, A.
Pub. info.: 2007 SAE world congress : technical paper.  2007.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2007
2.

Technical Paper
Technical Paper
2. Behavior of Shock Wave and Pressure Wave of SI Knocking with Super Rapid Compression Machine.
Katsumata, M. ; Tanabe, M.
Pub. info.: 2011 JSAE/SAE International Powertrains, Fuels and Lubricants Meeting : technical paper.  2011.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2011
3.

Conference Proceedings
Conference Proceedings
3. Phase defect printability of alternating phase shift masks for ArF lithography
Ohba, N. ; Ishikawa, K. ; Katsumata, M. ; Ohnuma, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.756-765,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Nd:YVO4 and YVO4 laser crystal integration by a direct bonding technique
Sugiyama, A. ; Fukuyama, H. ; Katsumata, M. ; Okada, Y.
Pub. info.: Integrated Optical Devices: Fabrication and Testing.  pp.361-368,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4944
5.

Conference Proceedings
Conference Proceedings
5. Advanced pattern correction method for fabricating highly accurate reticles
Sato, S. ; Koyama, M. ; Katsumata, M. ; Kagami, I. ; Kawahira, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.196-204,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
6.

Conference Proceedings
Conference Proceedings
6. Lithography of choice for the 45-nm node: new medium, new wavelength, or new beam?
Uesawa, F. ; Katsumata, M. ; Ogawa, K. ; Takeuchi, K. ; Omori, S. ; Yoshizawa, M. ; Kawahira, H.
Pub. info.: Optical Microlithography XVII.  pp.34-45,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Integrated OPC approach to line-end shortening effects on the photomask and silicon levels for ArF attenuated PSM lithography
Sato, S. ; Ozawa, K. ; Katsumata, M. ; Ohnuma, H.
Pub. info.: Optical Microlithography XVII.  pp.1093-1104,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377