1.

Conference Proceedings
Conference Proceedings
1. Characterization of overlay mark fidelity
Adel, M. ; Ghinovker, M.E. ; Poplawski, J.M. ; Kassel, E. ; Izikson, P. ; Pollentier, I.K. ; Leray, P. ; Laidler, D.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.437-444,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Performance study of new segmented overlay marks for advanced wafer processing
Adel, M.E. ; Allgair, J.A. ; Benoit, D.C. ; Ghinovker, M. ; Kassel, E. ; Nelson, C. ; Robinson, J.C. ; Seligman, G.S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.453-463,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. A comparison of methods for in-chip overlay control at the 65-nm node
Robinson, J.C. ; Stakely, M. ; Poplawski, J.M. ; Izikson, P. ; Kassel, E. ; Adel, M.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.384-394,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Test of a new sub-90-nm DR overlay mark for DRAM production
Gruss, S. ; Teipel, A. ; Fuelber, C. ; Kassel, E. ; Adel, M. ; Ghinovker, M. ; Izikson, P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.881-892,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
5.

Conference Proceedings
Conference Proceedings
5. Improved overlay metrology device correlation on 90-nm logic processes
Ueno, A. ; Tsujita, K. ; Kurita, H. ; Iwata, Y. ; Ghinovker, M. ; Poplawski, J.M. ; Kassel, E. ; Adel, M.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.222-231,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. In-field overlay uncertainty contributors: a back end study [6152-39]
Adel, M. ; Frommer, A. ; Kassel, E. ; Izikson, P. ; Leray, P. ; Schulz, B ; Seltmann, R. ; Bush, G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.615213-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152