1.

Conference Proceedings
Conference Proceedings
1. FIRM:a new software tool for calibration of lithography simulation
Kruger,D. ; Kalus,C.K. ; Erdmann,A. ; Friedrich,C. ; Kasmaier,R. ; Feike,A.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.161-171,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
2.

Conference Proceedings
Conference Proceedings
2. Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling
Friedrich,C. ; Mader,L. ; Erdmann,A. ; List,S. ; Gordon,R.L. ; Kalus,C.K. ; Griesinger,U.A. ; Pforr,R. ; Mathuni,J. ; Ruhl,G.G. ; Maurer,W.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1323-1335,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Hierarchical e-beam proximity correction in mask making
Hofmann,U. ; Kalus,C.K. ; Rosenbusch,A. ; Jonckheere,R. ; Hourd,A.C.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.150-158,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
4.

Conference Proceedings
Conference Proceedings
4. Hierarchical proximity correction using CAPROX
Hofmann,U. ; Kalus,C.K. ; Rosenbusch,A. ; Endo,H. ; Kimura,Y. ; Endo,A.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.558-567,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
5.

Conference Proceedings
Conference Proceedings
5. On the way to 1 Gb: demonstration of e-beam proximity effect correction for mask making
Rosenbusch,A. ; Kalus,C.K. ; Endo,H. ; Kimura,Y. ; Endo,A.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.312-318,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236