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22 results

Technical Paper

1. Imaging Flashing Injection of Acetone at Jet Engine Augmentor Conditions

K. Lucas ; C. Tseng ; T. Pourpoint ; R. Lucht ; W. Anderson

Pub. info.:	AIAA meeting papers on disc. 2007. Reston, Va.. American Institute of Aeronautics and Astronautics
Title of ser.:	AIAA Paper : Aerospace Sciences Meeting and Exhibit
Ser. no.:	2007

Conference Proceedings

2. Comparing traditional OPC to field-based OPC for 45-nm node production

R. Farnbach ; J. Tuttle ; M. S. John ; R. Brown ; D. Gerold ; K. Lucas ; R. Lugg ; J. Shiely ; M. Rieger

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

3. Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations

K. Lucas ; C. Cork ; J. Cobb ; B. Ward ; M. Drapeau ; C. Zhang ; J. Allgair ; M. Kling ; M. Rieger

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

4. The impact of scanner model vectorization on optical proximity correction

J. K. Tyminski ; T. Nakashima ; Q. Zhang ; T. Matsuyama ; K. Lucas

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

5. Efficient post-OPC lithography hotspot detection using a novel OPC correction and verification flow

Q. Zhang ; P. VanAdrichem ; K. Lucas

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

6. Functionality and performance improvements with field-based OPC

B. Painter ; K. Taravade ; L. Barnes ; R. Lugg ; J. Mayhew ; G. Newell ; K. Lucas

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

7. Interactions of double patterning technology with wafer processing, OPC and design flows

K. Lucas ; C. Cork ; A. Miloslavsky ; G. Luk-Pat ; L. Barnes

Pub. info.:	Optical Microlithography XXI. 1 pp.692403-1-692403-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

8. Analysis of OPC optical model accuracy with detailed scanner information

L. Zavyalova ; K. Lucas ; Q. Zhang ; Y. Fan ; S. Sethi

Pub. info.:	Optical Microlithography XXI. 1 pp.69241D-1-69241D-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

9. Modeling mask pellicle effects for OPC/RET

L. Zavyalova ; H. Song ; K. Lucas ; Q. Zhang ; J. Shiely

Pub. info.:	Photomask and next-generation lithography mask technology XV. 2 pp.70283B-1-70283B-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

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Conference Proceedings

10. Hybrid resist model to enhance continuous process window model for OPC

Q. Zhang ; K. Lucas

Pub. info.:	Photomask and next-generation lithography mask technology XV. 1 pp.70280L-1-70280L-10, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

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Author: K. Lucas