1.

Conference Proceedings
Conference Proceedings
1. Investigation of Cr defect in high Cr load logic mask
Jung, H.-Y. ; Choi, S.J. ; Kim, M.-S. ; Lee, D.W. ; Lee, J. ; Han, O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.38-45,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Investigation of subpellicle defect formation at KrF lithography
Lee, J. ; Lee, D.W. ; Kim, M.-S. ; Jung, H.-Y. ; Han, O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.231-237,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446