1.

Conference Proceedings
Conference Proceedings
1. Enhanced Pulsed Plasma Operation by Suppressing Side Band Modes
Chi, K.K. ; Hahm, J.H. ; Shin, K.S. ; Shin, H.S. ; Jung, C.O. ; Koh, Y.B. ; Lee, M.Y.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.96-105,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
2.

Conference Proceedings
Conference Proceedings
2. Study of the Boron-PhsosPhorous Doped and Undoped Silicatad Glass Etching in CHF3/Ar Plasma
Abatchav, M.K. ; Lee, C.K. ; Jung, C.O. ; Koh, Y.B. ; Lee, M.Y.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.522-530,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
3.

Conference Proceedings
Conference Proceedings
3. AMORPOUS TO CRYSTALLINE STRUCTURE TRANSITION DURING GROWTH OF SILICON BY PLASMA ENHANCE CHEMICAL VAPOR DEPOSITION
Varhue, W.J. ; Krause, S. ; Dea, J. ; Jung, C.O.
Pub. info.: Chemical perspectives of microelectronic materials : symposium held November 30-December 2, 1988, Boston, Massachusetts, U.S.A..  pp.269-275,  1989.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 131
4.

Conference Proceedings
Conference Proceedings
4. EFFECT OF ANNEALING ON THE STRUCTURE OF BURIED SiO2 LAYERS FORMED BY ELEVATED TEMPERATURE HIGH DOSE OXYGEN IMPLANTATION
Krause, S.J. ; Jung, C.O. ; Wilson, S.R. ; Lorigan, R.P. ; Burnham, M.E.
Pub. info.: Semiconductor-on-insulator and thin film transistor technology : symposium held December 3-6, 1985, Boston, Massachusetts, U.S.A..  pp.257-262,  1985.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 53