1.

Conference Proceedings
Conference Proceedings
1. Impact of high-order aberrations on the performance of the aberration monitor
Dirksen,P. ; Juffermans,C.A. ; Engelen,A. ; Bisschop,P.De ; Muellerke,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.9-17,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Application of a new approach to optical proximity correction
Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.639-647,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Novel aberration monitor for optical lithography
Dirksen,P. ; Juffermans,C.A. ; Pellens,R.J. ; Maenhoudt,M. ; Bisschop,P.De
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.77-86,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Focus and exposure dose determination using stepper alignment
Dirksen,P. ; Pellens,R. ; Juffermans,C.A. ; Reuhman-Huisken,M.E. ; Laan,H.van der
Pub. info.: Optical Microlithography IX.  Part2  pp.799-808,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
5.

Conference Proceedings
Conference Proceedings
5. Effect of processing on the overlay performance of a wafer stepper
Dirksen,P. ; Juffermans,C.A. ; Leeuwestein,A. ; Mutsaers,C. ; Nuijs,A. ; Pellens,R. ; Wolters,R. ; Gemen,J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.102-113,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050