1.

Conference Proceedings
Conference Proceedings
1. Integrated post tape outflow for fast design to mask turn-around time [5992-172]
Hung, C. -Y. ; Liu, Q. ; Zhang, L. ; Shang, S. ; Bailey, G. E. ; Jost, A. ; Brist, T.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599251-599251,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Lithography process related OPC development and verification demonstration on a sub-9Onm poly layer [5853-52]
Hung, C.-Y. ; Liu, Q. ; Zhang, L. ; Shang, S. ; Jost, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.678-685,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Two-dimensional image-based model calibration for OPC applications
Taravade, K.N. ; Croffie, E.H. ; Jost, A.
Pub. info.: Optical Microlithography XVII.  pp.1522-1527,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377