1.

Conference Proceedings
Conference Proceedings
1. Application of DoseMapper for 65-nm gate CD control: strategies and results [6349-16]
Jeewakhan, N. ; Shamma, N. ; Choi, S.-J. ; Alvarez, R. ; Son, D. H. ; Nakamura, M. ; Pici, V. ; Schreiber, J. ; Tzeng, W. ; Ang, S. ; Park, D.
Pub. info.: Photomask Technology 2006.  pp.63490G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. DUV mask writer for BEOL 90-nm technology layers
Hong, D. ; Krishnan, P. ; Coburn, D. ; Jeewakhan, N. ; Xie, S. ; Broussard, J. ; Ferguson, B. ; Green, K.G. ; Buck, P. ; Jackson, C.A. ; Martinez, L.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.9-19,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256