1.

Conference Proceedings
Conference Proceedings
1. Double patterning with multilayer hard mask shrinkage for sub-0.25 k1 lithography
H. J. Liu ; W. H. Hsieh ; C. H. Yeh ; J. S. Wu ; H. W. Chan ; W. B. Wu ; F. Y. Chen ; T. Y. Huang ; C. L. Shih ; J. P. Lin
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Spacer double patterning technique for sub-40nm DRAM manufacturing process development
W. Shiu ; W. Ma ; H. W. Lee ; J. S. Wu ; Y. M. Tseng
Pub. info.: Lithography Asia 2008.  2  pp.71403Y-1-71403Y-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140