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Conference Proceedings
J. K. Tyminski ; T. Matsuyama ; T. Nakashima ; T. Schmoeller ; J. Lewellen
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Optical microlithography XX . 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
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6520
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Conference Proceedings
J. K. Tyminski ; T. Nakashima ; Q. Zhang ; T. Matsuyama ; K. Lucas
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Photomask and next-generation lithography mask technology XIV . 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
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6607
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Conference Proceedings
J. K. Tyminski ; S. P. Renwick
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Lithography Asia 2008 . 2 pp.71402A-1-71402A-10, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
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Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
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Conference Proceedings
Q. Zhang ; J. K. Tyminski ; K. Lucas
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Photomask technology 2007 . 3 pp.673056-1-673056-12, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
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Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
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Conference Proceedings
J. K. Tyminski ; Q. Zhang ; K. Lucas ; L. Depre ; P. VanAdrichem
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Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA . 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6521