1.

Conference Proceedings
Conference Proceedings
1. Forward solve algorithms for optical critical dimension metrology
P. L. Jiang ; H. Chu ; J. Hench ; D. Wack
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69221O-1-69221O-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
2.

Conference Proceedings
Conference Proceedings
2. Opportunities and challenges for optical CD metrology in double patterning process control
D. C. Wack ; J. Hench ; L. Poslavsky ; J. Fielden ; V. Zhuang
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69221N-1-69221N-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922