1.

Conference Proceedings
Conference Proceedings
1. Wet Etch Characteristics of Hafnium Silicate Layers
M. Claes ; V. Paraschiv ; D. Dictus ; T. Conard ; W. Boullari ; S. Vanhaelemeersch ; S. De Gendt ; A. Delabie ; S. Van Elshoclst ; C. Zhao ; J. Everaert
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.633-644,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
2.

Conference Proceedings
Conference Proceedings
2. Development of 300 mm MOCVD HfSiO x Process
X. Shi ; M. Schoekers ; L. Date ; A. Rothschild ; J. Everaert ; S. Van Elshocht ; E. Rosseel ; S. Kher
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.417-424,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)