1.

Conference Proceedings
Conference Proceedings
1. Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics [6349-138]
Tsuji, Y. ; Kikuiri, N. ; Murakami, S. ; Takahara, K. ; Isomura, I. ; Tamura, Y. ; Yamashita, K. ; Hirano, R. ; Tateno, M. ; Matsumura, K. ; Takayama, N. ; Usuda, K.
Pub. info.: Photomask Technology 2006.  pp.63493M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. High-performance DUV inspection system for 100-nm generation masks
Tsuchiya, H. ; Isomura, I. ; Nakashima, K. ; Yamashita, K. ; Watanabe, T. ; Nishizaka, T. ; Ikeda, H. ; Sawa, E. ; Ikeda, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.526-533,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
3.

Conference Proceedings
Conference Proceedings
3. Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
Kikuiri, N. ; Murakami, S. ; Tsuchiya, H. ; Tateno, M. ; Takahara, K. ; Imai, S. ; Hirano, R. ; Isomura, I. ; Tsuji, Y. ; Tamura, Y. ; Matsumura, K. ; Usuda, K. ; Otaki, M. ; Suga, O. ; Ohira, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
Tojo, T. ; Hirano, R. ; Tsuchiya, H. ; Oaki, J. ; Nishizaka, T. ; Sanada, Y. ; Matsuki, K. ; Isomura, I. ; Ogawa, R. ; Kobayashi, N. ; Nakashima, K. ; Sugihara, S. ; Inoue, H. ; Imai, S. ; Suzuki, H. ; Sekine, A. ; Taya, M. ; Miwa, A. ; Yoshioka, N. ; Ohira, K. ; Chung, D. -H. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1011-1023,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567