1.

Conference Proceedings
Conference Proceedings
1. Maskless EUV lithography via optically addressed modulator
Teramoto, Y. ; Sato, H. ; Bessho, K. ; Niimi, G. ; Shirai, T. ; Yamatani, D. ; Takemura, T. ; Yokoto, T. ; Paul, K. C. ; Kabuki, K. ; Miyauchi, K. ; Ikeuchi, M. ; Hotta, K. ; Yoshioka, M. ; Toyoda, K.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.349-354,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
2.

Technical Paper
Technical Paper
2. GMR Revolution Sensors for Automobiles
Taguchi, M. ; Shinjo, I. ; Kawano, Y. ; Ikeuchi, M. ; Ohashi, Y.
Pub. info.: 2000 SAE world congress : technical paper.  pp.65-72,  2000.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2000
3.

Conference Proceedings
Conference Proceedings
3. Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography
Teramoto, Y. ; Sato, H. ; Bessho, K. ; Miyauchi, K. ; Ikeuchi, M. ; Okubo, K. ; Yoshioka, M. ; Toyoda, K.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.767-775,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
4.

Conference Proceedings
Conference Proceedings
4. Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM [6151-148]
Teramoto, Y. ; Niimi,G. ; Yamatani, D. ; Joshima, Y. ; Bessho,K. ; Shirai,T. ; Takemura,T. ; Yokota, T. ; Yabuta,H. ; Paul, K. C. ; Kabuki, K. ; Miyauchi, K. ; Ikeuchi, M. ; Hotta,K. ; Yoshioka,M. ; Sato,H.
Pub. info.: Emerging Lithographic Technologies X.  pp.615147-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
5.

Conference Proceedings
Conference Proceedings
5. High-repetition-rate MPC generator-driven capillary Z-pinch EUV source
Teramoto, Y. ; Sato, H. ; Bessho, K. ; Shirai, T. ; Yamatani, D. ; Takemura, T. ; Yokota, T. ; Paul, K.C. ; Kabuki, K. ; Miyauchi, K. ; Ikeuchi, M. ; Okubo, K. ; Hotta, K. ; Yoshioka, M. ; Toyoda, K.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.935-942,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374