1.

Conference Proceedings
Conference Proceedings
1. Integrating RET and mask manufacturability in memory designs for local interconnect for sub-100nm trenches
Kachwala, N. ; Iandolo, W. ; Brist, T. ; Farnbach, R.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.141-149,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Accuracy vs. complexity: OPC solutions and tradeoffs
Banachowicz, B. ; Iandolo, W. ; Balasinski, A.P. ; Staud, W. ; Ma, M.W. ; Sweis, J.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.32-41,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
3.

Conference Proceedings
Conference Proceedings
3. Novel procedure for mask disposition electrical signatures of mask defects
Balasinski, A. ; Iandolo, W. ; Ray, O. ; Karklin, L. ; Axelrad, V.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.606-613,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
4.

Conference Proceedings
Conference Proceedings
4. Optimization of dummy pattern for mask data size reduction
Iandolo, W. ; Gilboa, Y. ; Phan, B. ; Balasinski, A.P.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.798-805,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256