1.

Conference Proceedings
Conference Proceedings
1. A Novel Concept for Contact Etch Residue Removal
I.J. Vos ; D. Hellin ; S. Demuynck ; O. Richard ; T. Conard
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.403-407,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
2.

Conference Proceedings
Conference Proceedings
2. The Effect of Delay Between Dry Etch and Wet Clean Processing Steps on Cleaning of Post-Etch Residues
D. Hellin ; I.J. Vos ; G. Vereecke ; E. Pavel ; W. Boullart
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.283-290,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)