1.

Conference Proceedings
Conference Proceedings
1. Methodology for a sub-90nm contact layer OPC with DEM flow demonstration
Hung, C.-Y. ; Zhang, B. ; Zhang, J. ; Xing, G. Q.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.14-20,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Conference Proceedings
Conference Proceedings
2. Increasing post OPC layout verification coverage using a full-chip simulation based verification method
Hung, C.-Y. ; Wang, Y. D. ; Deng, Z. X. ; Gao, G. S. ; Fan, M. H.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.315-319,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
3.

Conference Proceedings
Conference Proceedings
3. RELAX: resolution enhancement by laser-spectrum adjusted exposure
Hung, C.-Y. ; Wang, C.-H. ; Liu, Q.-W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.447-455,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. The Morphology, Crystallography, and Formation Mechanism of Grain Boundary Proeutectoid Cementite in High Carbon Steels
Spanos, G. ; Hung, C.-Y. ; Kral, M. V.
Pub. info.: THERMEC '2003 : International Conference on Processing & Manufacturing of Advanced Materials, July 7-11, 2003, Leganés, Madrid, Spain.  pp.1599-1604,  2003.  Zuerich-Uetikon, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 426-432
5.

Conference Proceedings
Conference Proceedings
5. An effective layout optimization method via LFD concept [6349-115]
Wang, C.-H. ; Deng, Z. ; Gao, G. ; Hung, C.-Y.
Pub. info.: Photomask Technology 2006.  pp.63492Z-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Illumination optimization for 65nm technology node [6349-188]
Wang, C.-H. ; Liu, Q. ; Zhang, L. ; Hung, C.-Y.
Pub. info.: Photomask Technology 2006.  pp.63494V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
7.

Conference Proceedings
Conference Proceedings
7. Lithography process related OPC development and verification demonstration on a sub-9Onm poly layer [5853-52]
Hung, C.-Y. ; Liu, Q. ; Zhang, L. ; Shang, S. ; Jost, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.678-685,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
8.

Conference Proceedings
Conference Proceedings
8. No-forbidden-pitch SRAF rules for advanced contact lithography [6349-177]
Wang, C.-H. ; Liu, Q. ; Zhang, L. ; Hung, C.-Y.
Pub. info.: Photomask Technology 2006.  pp.63494K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349