1.

Conference Proceedings
Conference Proceedings
1. Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
Lee, B. ; Hung, R. ; Lin, O. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Hsu, M. ; Hsu, S. D.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.114-121,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Conference Proceedings
Conference Proceedings
2. Development of automatic OPC treatment and layout decomposition for double dipole lithography for low-k1 imaging
Chiou, T.-B. ; Chen, A. C. ; Hsu, S. D. ; Eurlings, M. ; Hendrickx, E.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.21-31,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
3.

Conference Proceedings
Conference Proceedings
3. Application of CPL mask for whole chip 5nm DRAM patterning [5853-69]
Lin, 0. ; Hung, R. ; Lee, B. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Lin, J. ; Hsu, M. ; Hsu, S. D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.835-843,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853