1.

Conference Proceedings
Conference Proceedings
1. Restructuring of Mechanically Deboned Turkey by Extrusion Processing
Hsieh, F. ; Peng, I. C. ; Clarks, A. D. ; Mulvaney, S. J. ; Bailey, M. E. ; Heymann, H. ; Huff, H. E.
Pub. info.: AIChE SUMMER NATIONAL MEETING -PHILADELPHIA, PA -AUG 20-23, 1989.  1989.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1989
2.

Conference Proceedings
Conference Proceedings
2. Practical approach for AAPSM image imbalance correction for sub-100-nm lithography
Cho, H.L. ; Lin, S.Y. ; Hsieh, F. ; Kroyan, A. ; Liu, H.-Y. ; Huang, J.H. ; Hsu, S.-H. ; Huang, I-H. ; Lin, B.S.-M. ; Hung, K.-C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.778-786,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Investigation of phase variation impact on CPL PSM for low k1 imaging
Lin, C. ; Hsu, M. ; Hsieh, F. ; Lin, S.Y. ; Hsu, S.D. ; Shi, X. ; Van Den Broeke, D.J. ; Chen, J.F. ; Tang, F.C. ; Hsieh, W.A. ; Huang, C.Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.804-811,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Low k1 lithography patterning option for the 90-nm and 65-nm nodes
Hsu, S.D. ; Van Den Broeke, D.J. ; Shi, X. ; Hsu, M. ; Wampler, K.E. ; Chen, J.F. ; Yu, A. ; Yang, S.C. ; Hsieh, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.812-828,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. 65-nm full-chip implementation using double dipole lithography
Hsu, S.D. ; Chen, J.F. ; Cororan, N. ; Knose, W.T. ; Broeke, D.J.V.D. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, C.M. ; Eurlings, M. ; Finders, J. ; Chiou, T.-B. ; Socha, R.J. ; Conley, W. ; Hsieh, Y.W. ; Tuan, S. ; Hsieh, F.
Pub. info.: Optical Microlithography XVI.  Part One  pp.215-231,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Implementing AAPSM in 90-nm product with practical image imbalance correction
Lin, B.S. ; Hsu, S.- ; Huang, I.H. ; Chen, K. ; Hsieh, F. ; Hsu, T. ; Liu, H.-Y. ; Kroyan, A. ; Hsu, F. ; Huang, J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.103-111,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. Evaluation, reduction, and monitoring of progressive defects on 193-nm reticles for low-k1 process
Shiao, C.H. ; Tsai, C.-C. ; Hsu, T. ; Tuan, S. ; Chang, D. ; Chen, R. ; Hsieh, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.225-230,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
8.

Conference Proceedings
Conference Proceedings
8. Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
Hsu, M. ; Laidig, T.L. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Chen, J.F. ; Van Den Broeke, D.J. ; Hsieh, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.402-413,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446