1.

Conference Proceedings
Conference Proceedings
1. PRE-OXIDATION SILICON CLEANING AND ITS RELATION TO MOS RELIABILITY AND PROCESS-INDUCED DAMAGE
Kasi, S.R. ; Rubloff, G.W. ; Cohen, S.A. ; Hsia, L.C.
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.125-130,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
2.

Conference Proceedings
Conference Proceedings
2. Ultra-thin Tungsten CVD Nucleation Layer for Sub-100 nm Contact Applications
Gupta, J. ; Sudijono, J. ; Hsia, L.C. ; Singh, S.
Pub. info.: Copper Interconnects, New Contact Metallurgies/Structures, and Low-K Interlevel Dielectrics : proceedings of the International Symposium.  pp.16-20,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-10
3.

Conference Proceedings
Conference Proceedings
3. A Novel Approach for Dual Damascene Trench Etch for 90 nm Low-k Inter- Connect with No Middle Etch Stop Layer
Chen, T.Q. ; Cong, H. ; Liu, W.P. ; Siew, Y.K. ; Pradeep, Y. ; Hsia, L.C. ; Jaiswal, R. ; Jain, A. ; Sim, I.
Pub. info.: Copper Interconnects, New Contact Metallurgies/Structures, and Low-K Interlevel Dielectrics : proceedings of the International Symposium.  pp.182-187,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-10
4.

Conference Proceedings
Conference Proceedings
4. Optimization of alternating PSM mask process for 65-nm poly-gate patterning using 193-nm lithography
Tan, S.-K. ; Lin, Q. ; Hsia, L.C. ; Sun, S.-C.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1125-1136,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040