1.

Conference Proceedings
Conference Proceedings
1. Model study by FT-IR of the interaction of select cholate dissolution inhibitors with poly(norbornene-alt-maleic anhydride) and its derivatives
Dabbagh, G. ; Houlihan, F. M. ; Ruskin, I. ; Hutton, R. S. ; Nalamasu, Q. ; Reichmanis, E. ; Gabor, A. H. ; Medina, A. N.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.86-93,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Optimization of 193-nm single-layer resists through statistical design
Cabor, A. H. ; Dimov, O. ; Medina, A. N. ; Neisser, M. O. ; Slater, S. G. ; Wang, R. H. ; Houlihan, F. M. ; Cirelli, R. A. ; Dabbagh, G. ; Hutton, R. S. ; Rushkin, I. L. ; Sweeney, J. R. ; Timko, A. G. ; Nalamasu, O. ; Reichmanis, E.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.221-229,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins
Rushkin, I. L. ; Houlihan, F. M. ; Kometani, J. M. ; Hutton, R. S. ; Timko, A. G. ; Reichmanis, E. ; Nalamasu, O. ; Gabor, A. H. ; Medina, A. N. ; Slater, S. G. ; Neisser, M. O.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.44-50,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography
Cirelli, R. A. ; Bude, J. ; Mansfield, W. M. ; Timp, G. L. ; Klemens, F. P. ; Watson, C. P. ; Weber, G. R. ; Sweeney, J R. ; Houlihan, F. M. ; Gabor, A. H. ; Baumann, F. ; Buonanno, M. ; Forsyth, G. F. ; Barr, D. ; Lee, T. C. ; Rafferty, C. S. ; Hutton, R. S. ; Timko, A. G. ; Hergenrother, J. ; Reichmanis, E. ; Harriott, L. R. ; Hillenius, S. J. ; Nalamasu, O.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.295-305,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
5.

Conference Proceedings
Conference Proceedings
5. An Analysis of Process Issues with Chemically Amplified Positive Resists
Nalamasu, O. ; Timko, A. G. ; Reichmanis, Elsa ; Houlihan, F. M. ; Novembre, Anthony E. ; Tarascon, R. ; Munzel, N. ; Slater, S. G.
Pub. info.: Microelectronics technology : polymers in advanced imaging and packaging : developed from a symposium sponsored by the ACS Division of Polymeric Materials: Science and Engineering, Inc., and the Polymers for Microelectronics Division of the Society of Polymer Science, Japan, at the 209th National Meeting of the American Chemical Society, Anaheim, California, April 2-6, 1995.  pp.4-,  1995.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 614
6.

Conference Proceedings
Conference Proceedings
6. Resist outgassing as a function of differing photoadditives
Houlihan, F. M. ; Rushkin, I. L. ; Hutton, R. S. ; Timko, A. G. ; Nalamasu, O. ; Reichmanis, E. ; Gabor, A. H. ; Medina, A. N. ; Malik, S. ; Neiser, M. ; Kunz, R. R. ; Downs, D. K.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.264-274,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
7.

Conference Proceedings
Conference Proceedings
7. Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate: A Potential Generator and Dissolution Inhibitor Solubilizable through Chemical Amplification
Houlihan, F. M. ; Chin, E. ; Nalamasu, O. ; Kometani, J. M.
Pub. info.: Polymers for microelectronics : resists and dielectrics.  pp.25-,  1994.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 537
8.

Conference Proceedings
Conference Proceedings
8. Chemical Amplification Mechanisms for Microlithography
Reichmanis, E. ; Houlihan, F. M. ; Nalamasu, O. ; Neenan, T. X.
Pub. info.: Polymers for microelectronics : resists and dielectrics.  pp.2-,  1994.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 537
9.

Conference Proceedings
Conference Proceedings
9. Acid-Catalyzed Thermolytic Depolymerization of Polycarbonates: A New Approach to Dry-Developing Resist Materials
Frechet, J. M. J. ; Eichler, E. ; Stanciulescu, M. ; Iizawa, T. ; Bouchard, F. ; Houlihan, F. M. ; Willson, C. G.
Pub. info.: Polymers for high technology : electronics and photonics.  pp.138-,  1987.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 346
10.

Conference Proceedings
Conference Proceedings
10. Correlation of the Strength of Photogenerated Acid with the Post-Exposure Delay Effect in Positive-Tone Chemically Amplified Deep-UV Resists
Houlihan, F. M. ; Chin, E. ; Nalamasu, O. ; Kometani, J. M. ; Harley, R.
Pub. info.: Microelectronics technology : polymers in advanced imaging and packaging : developed from a symposium sponsored by the ACS Division of Polymeric Materials: Science and Engineering, Inc., and the Polymers for Microelectronics Division of the Society of Polymer Science, Japan, at the 209th National Meeting of the American Chemical Society, Anaheim, California, April 2-6, 1995.  pp.84-,  1995.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 614