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15 results

Conference Proceedings

1. *RECENT PROGRESS IN EXCIMER LASER LITHOGRAPHY

Higashikawa, I. ; Nonaka, M. ; Sato, T. ; Nakase, M. ; Ito, S. ; Horioka, K. ; Horrike

Pub. info.:	Laser and particle-beam chemical processing for microelectronics : symposium held December 1-3, 1987, Boston, Massachusetts, USA. pp.3-12, 1988. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	101

Conference Proceedings

2. Development of fluoropolymers tor pellicle in 157nm lithography

Okada, S. ; Yamamoto, H. ; Matsukura, I. ; Shirota, N. ; Ishibashi, Y. ; Sasaki, H. ; Higashikawa, I. ; Wakamiya, W.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1320-1328, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

3. Inspection and printability of programmed defects on reticles for 0.200- and 0.175-μm rule devices

Yamaguchi, S. ; Kanai, H. ; Komano, H. ; Sakurai, H. ; Kondo, T. ; Itoh, M. ; Mori, I. ; Higashikawa, I.

Pub. info.:	Photomask and X-Ray Mask Technology VI. pp.546-556, 1999. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3748

Conference Proceedings

4. The guideline of reticle data management(Ver. 2)

Iriki, N. ; Miyazaki, N. ; Homma, M. ; Sato, T. ; Onodera, T. ; Matsuda, T. ; Uga, T. ; Higashino, H. ; Higashikawa, I. ; Yoshioka, N.

Pub. info.:	20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.60-69, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5504

Conference Proceedings

5. Actinic aerial image measurement tool for 157-nm mask qualification

Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Engel, T. ; Zibold, A.M. ; Hertfelder, C. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Semmler, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.533-544, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Development of pellicle for F2(157-nm) excimer laser

Shigematsu, S. ; Nakano, T. ; Shigemoto, H. ; Kondo, M. ; Nakagawa, H. ; Sasaki, H. ; Higashikawa, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.606-616, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Actinic aerial image measurement tool for 157-nm lithography

Kuschnerus, P. ; Engel, T. ; Zibold, A.M. ; Hertfelder, C. ; Yasui, T. ; Higashikawa, I. ; Schilz, C.M. ; Semmler, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.400-406, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. Guideline of reticle data management

Miyazaki, N. ; Iriki, N. ; Homma, M. ; Sato, T. ; Mori, M. ; Imoriya, T. ; Onodera, T. ; Matsuda, T. ; Higashino, H. ; Okuda, K. ; Higashikawa, I. ; Yoshioka, N.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1079-1090, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

9. Aerial image measurement system for 157-nm lithography

Eisner, K. ; Kuschnerus, P. ; Urbach, J.-P. ; Schilz, C.M. ; Engel, T. ; Zibold, A.M. ; Yasui, T. ; Higashikawa, I.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.469-477, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

10.

Conference Proceedings

10. Actinic aerial image measurement for qualification of defect on 157-nm photomask

Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Degel, W. ; Boehm, K. ; Zibold, A.M. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Teuber Semmler, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.743-750, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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