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16 results

Conference Proceedings

1. Feasibility studies of ArF Lithography for sub-130-nm lithography

Lee,S.-H. ; Yim,D. ; Ham,Y.-M. ; Baik,K.-H. ; Choi,I.H.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.290-301, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

2. Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography

Kim,S.-K. ; Kim,Y.-S. ; Kim,J.-S. ; Bok,C.-K. ; Ham,Y.-M. ; Baik,K.-H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.435-442, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography

Ham,Y.-M. ; Kim,S.-K. ; Kim,S.-J. ; Hur,C. ; Kim,Y.-S. ; Baik,K.-H. ; Kim,B.-H. ; Ahn,D.-J.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1053-1061, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. Comparison study for sub-150-nm DUV lithography between high-NA KrF and ArF lithography

Yim,D. ; Kwon,K.-S. ; Ham,Y.-M. ; Baik,K.-H.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.138-149, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Reduction of isolated-dense bias by optimization off-axis illumination for 150-nm lithography using KrF

Kim,S.-K. ; Ahn,C.-N. ; Kim,S.-M. ; Ham,Y.-M. ; Baik,K.-H.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.691-696, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

6. Degree of patterning performance(DOPP)at low K lithography

Yim,D. ; Lee,S.-H. ; Gil,M.-G. ; Ham,Y.-M. ; Kim,B.-H. ; Baik,K.-H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1250-1259, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Simulation and modeling of electron-beam lithography for delineating 0.2-ｦﾌm line and space patterns

Ham,Y.-M. ; Lee,C.-B. ; Suh,T.W. ; Chun,K. ; Lee,J.

Pub. info.:	Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California. pp.159-168, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2723

Conference Proceedings

8. Profile characteristics and simulation of chemically amplified resists in electron-beam lithography

Ham,Y.-M. ; Lee,C. ; Kim,S.-H. ; Chun,K.

Pub. info.:	Microlithographic Techniques in IC Fabrication. pp.154-160, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3183

Conference Proceedings

9. Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

Koo,S.-S. ; Kim,S.-J. ; Paek,S.-W. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Optical Microlithography XIV. 4346 pp.770-777, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography

Yune,H.-S. ; Kim,H.-B. ; Kim,W.-H. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Optical Microlithography XIV. 4346 pp.241-250, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

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Author: Ham,Y.-M.