1.

Conference Proceedings
Conference Proceedings
1. Tunable transmission phase mask options for 65/45nm node gate and contact processing
Kasprowicz, B. S. ; Conley, W. ; Ham, Y.-M. ; Cangemi, M. J. ; Morgana, N. ; Cottle, R. ; Progler, C. J. ; Wu, W. ; Litt, L. C. ; Cobb, J. ; Roman, B.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1469-1477,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Validation of Nu-Flare e-beam emulation software in a simulation environment [5853-06]
Ritter, D. ; Brooker, P. ; Lewellen, J. ; Ham, Y.-M. ; Martin, P. ; Cottle, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.52-57,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Exploring new high speed mask aware RET verification flows [5853-97]
Martin, P. ; Progler, C. J. ; Ham, Y.-M. ; Kasprowicz, B. ; Gray, R. ; Wiley, J. N. ; Yu, Z. ; Ye, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.114-123,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853