1.

Conference Proceedings
Conference Proceedings
1. Influence of mask induced polarization effects on a pattern printability
Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.576-586,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Current status of 157-nm lithography using a full-field scanner
Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1260-1268,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754