1.

Conference Proceedings
Conference Proceedings
1. The advanced mask CD MTT control using dry etch process for sub 65 nm tech
S. J. Jo ; H. Y. Jung ; D. W. Lee ; J. C. Shin ; J. Y. Jun
Pub. info.: Photomask technology 2007.  1  pp.673008-1-673008-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
2.

Conference Proceedings
Conference Proceedings
2. Design for CD correction strategy using a resist shrink method via UV irradiation for defect-free photomask
J. H. Ryu ; D. W. Lee ; H. Y. Jung ; S. P. Kim ; O. Han
Pub. info.: Photomask technology 2007.  1  pp.67300K-1-67300K-10,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730