1.

Conference Proceedings
Conference Proceedings
1. Distribution control of protecting groups and its effect on LER for EUV molecular resist
D. Shiono ; H. Hada ; H. Yukawa ; H. Oizumi ; I. Nishiyama ; K. Kojima ; H. Fukuda
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Development of novel positive-tone resists for EUVL
T. Owada ; T. Watanabe ; H. Kinoshita ; H. Oizumi ; I. Nishiyama
Pub. info.: Advances in resist materials and processing technology XXV.  2  pp.692346-1-692346-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
3.

Conference Proceedings
Conference Proceedings
3. Current benchmarking results of EUV resist at Selete
D. Kawamura ; K. Kaneyama ; S. Kobayashi ; H. Oizumi ; T. Itani
Pub. info.: Lithography Asia 2008.  1  pp.714008-1-714008-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
4.

Conference Proceedings
Conference Proceedings
4. Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror
K. Motai ; H. Oizumi ; S. Miyagaki ; I. Nishiyama ; A. Izumi ; T. Ueno ; Y. Miyazaki ; A. Namiki
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
5.

Conference Proceedings
Conference Proceedings
5. Resist evaluation for EUV application at ASET
D. Goo ; Y. Tanaka ; Y. Kikuchi ; H. Oizumi ; I. Nishiyama
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
6.

Conference Proceedings
Conference Proceedings
6. An analysis of EUV-resist outgassing measurements
K. R. Dean ; I. Nishiyama ; H. Oizumi ; A. Keen ; H. Cao ; W. Yueh ; T. Watanabe ; P. Lacovig ; L. Rumiz ; G. Denbeaux ; J. Simon
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
7.

Conference Proceedings
Conference Proceedings
7. Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning
Y. Nishiyama ; T. Anazawa ; H. Oizumi ; I. Nishiyama ; O. Suga
Pub. info.: Emerging lithographic technologies XII.  1  pp.692116-1-692116-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921