1.

Conference Proceedings
Conference Proceedings
1. Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography
H. Watanabe ; S. Komae ; S. Tanaka ; R. Nohdomi ; T. Yamazaki ; H. Nakarai ; J. Fujimoto ; T. Matsunaga ; T. Saito ; K. Kakizaki ; H. Mizoguchi
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography
M. Yoshino ; H. Nakarai ; T. Ohta ; H. Nagano ; H. Umeda
Pub. info.: Optical Microlithography XXI.  2  pp.69242S-1-69242S-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924