H. Anze ; S. Yamasaki ; S. Tamamushi ; Y. Ogawa ; E. Murakami
Pub. info.:
Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan. pp.197-203, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
J. Yashima ; K. Ohtoshi ; N. Nakayamada ; H. Anze ; T. Katsumata ; T. Iijima ; R. Nishimura ; S. Fukutome ; N. Miyamoto ; S. Wake ; Y. Sakai ; S. Sakamoto ; S. Hara ; H. Higurashi ; K. Hattori ; K. Saito ; R. Kendall ; S. Tamamushi
Pub. info.:
Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering