1.

Conference Proceedings
Conference Proceedings
1. Characterization of positive DUV resists at 0.25-ｦﾌm polygate using organic and inorganic antireflection schemes
Dass,S.K. ; Orvek,K.J. ; Gruber,L. ; Broomfield,M.C. ; Tremblay,J. ; Piasecki,M.
Pub. info.: Optical Microlithography X.  pp.405-416,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
2.

Conference Proceedings
Conference Proceedings
2. Migrating deep-UV lithography to the 0.25-ｦﾌm regime:issues and outlook
Orvek,K.J. ; Dass,S.K. ; Gruber,L. ; Dumford,S.A. ; Piasecki,M. ; Pollard,G.W. ; Fink,I.D.
Pub. info.: Optical Microlithography IX.  Part1  pp.398-409,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726