1.

Conference Proceedings
Conference Proceedings
1. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology
Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.138-150,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Printing high-density patterns with dark-field 193-nm lithography
Wood Ⅱ,O.R. ; White,D.L. ; Tennant,D.M. ; Cirelli,R.A. ; Sweeney,J.R. ; Blakey,M.I. ; Griffith,J.E.
Pub. info.: Optical Microlithography XIV.  4346  pp.1470-1477,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings
Conference Proceedings
3. Stability of glass probe tips for critical dimension measurement
Griffith,J.E. ; Miller,G.L. ; Hopkins,L.C. ; Bryson,C.E. ; Snyder,E.J. ; Plombon,J.J. ; Vasilyev,L.A. ; Bindell,J.B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.350-360,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050