1.

Conference Proceedings
Conference Proceedings
1. Damage testing of pellicles for 193-nm lithography
Liberman,V. ; Kunz,R.R. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Grenville,A. ; Bates,A.K. ; Van,Peski,C.K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.480-495,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Electrical critical dimension metrology for 100-nm Iinewidths and below
Grenville,A. ; Coombs,B. ; Hutchinson,J.M. ; Kuhn,K.J. ; Miller,D. ; Troccolo,P.M.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.452-459,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Progress in 157-nm lithography development at Intel:resists and reticles
Rao,V. ; Panning,E.M. ; Liao,L. ; Hutchinson,J.M. ; Grenville,A. ; Holl,S.M. ; Bruner,D. ; Balasubramanian,R. ; Kuse,R. ; Dao,G.T. ; Zheng,J.-F. ; Orvek,K.J. ; Langston,J.C. ; Lo,F.-C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1574-1581,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Assessment of optical coatings for 193-nm lithography
Liberman,V. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Grenville,A. ; Bates,A.K. ; Van,Peski,C.K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.470-479,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
5.

Conference Proceedings
Conference Proceedings
5. Marathon damage testing of pellicles for 193-nm lithography
Grenville,A. ; Liberman,V. ; Kunz,R.R. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.456-463,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236