1.

Conference Proceedings
Conference Proceedings
1. Cost analysis on the next-generation lithography technology
Gomei,Y.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.1-8,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
2.

Conference Proceedings
Conference Proceedings
2. Present status of the ASET at-wavelength phase-shifting polnt diffraction interferometer
Sugisaki,K. ; Zhu,Y. ; Gomei,Y. ; Niibe,M. ; Watanabe,T. ; Kinoshita,H.
Pub. info.: Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA.  pp.47-53,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4146
3.

Conference Proceedings
Conference Proceedings
3. Overview of ASET PXL and EUVL programs in Japan
Gomei,Y.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.2-9,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
4.

Conference Proceedings
Conference Proceedings
4. Study on x-ray irradiation stability of absorber materials for x-ray masks by stress measurement
Ashikaga,K. ; Tsuboi,S. ; Yamashita,Y. ; Sugihara,S. ; Gomei,Y. ; Shoki,T. ; Yamaguchi,Y. ; Ohta,T.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.204-210,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793