1.

Conference Proceedings
Conference Proceedings
1. Integration of Low and High Temperature Junction Anneals for 45 nm CMOS
Lindsay, R. ; Pawlak, B. ; Henson, K. ; Satta, A. ; Severi, S. ; Lauwers, A. ; Surdeanu, R. ; McCoy, S. ; Gelpey, J. ; Pages, X. ; Maex, K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.145-156,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
2.

Conference Proceedings
Conference Proceedings
2. RAPID THERMAL ANNEALING OF ION IMPLANTED p-n JUNCTIONS IN SILICON
Ho, C.C. ; Kwor, R. ; Araujo, C. ; Gelpey, J.
Pub. info.: Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A..  pp.225-232,  1985.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 52
3.

Conference Proceedings
Conference Proceedings
3. RAPID ANNELING OF SILICON
Hodgson, R. T. ; Deline, V. ; Mader, S. M. ; Morehead, F. F. ; Gelpey, J.
Pub. info.: Energy beam-solid interactions and transient thermal processing : symposium held November 1983 in Boston, Massachusetts, U.S.A..  pp.253-258,  1984.  New York.  North-Holland
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 23
4.

Conference Proceedings
Conference Proceedings
4. (18.5) 11:35 - 11:55 AM - Ultra-Shallow Junction Formation in Strained Si/Sil-xGex using Flash-Assist RTA
Kohli, P. ; Wise, R. ; Braithwaite, G. ; Currie, M. T. ; Lochtefeld, A. ; Rodder, M. ; Bennett, J. ; Gostowski, M. ; Nguyen, B. ; Cleavelin, R. ; Yu, S. ; Pas, M. ; Gelpey, J. ; McCoy, S. ; Campion, A. ; Chaumont, M. (SEMATECH)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.1113-1114,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
5.

Conference Proceedings
Conference Proceedings
5. Recent Developments in Ultratlsin Nitride Gate Stack Prepared by In-Situ RTP Multiprocessing for CMOS ULSI
Song, S.C. ; Kini, B.Y. ; Loan, H.F. ; Kwong, D.-L. ; Gardner, M. ; Fulford, J. ; Wristers, D. ; Gelpey, J. ; Marcus, S.
Pub. info.: Advances in rapid thermal processing : proceedings of the symposium.  pp.45-56,  1999.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-10
6.

Conference Proceedings
Conference Proceedings
6. GAS FLOW ENGINEERING IN RAPID THERMAL PROCESSING
Nenyei, Z. ; Sommer, H. ; Gelpey, J. ; Bauer, A.
Pub. info.: Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A..  pp.401-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 342
7.

Conference Proceedings
Conference Proceedings
7. Device Characteristics of Ultra-Shallow Junctions Formed by fRTP Annealing
Satta, A. ; Lindsay, R. ; Severi, S. ; Henson, K. ; Maex, K. ; McCoy, S. ; Gelpey, J. ; Elliott, K.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.15-20,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
8.

Conference Proceedings
Conference Proceedings
8. A Comparison Of Spike, Flash, SPER and Laser Annealing For 45nm CMOS
Lindsay, R. ; Pawlak, B. ; Kittl, J. ; Henson, K. ; Torregiani, C. ; Giangrandi, S. ; Surdeanu, R. ; Vandervorst, W. ; Mayur, A. ; Ross, J. ; McCoy, S. ; Gelpey, J. ; Elliott, K. ; Pages, X. ; Satta, A. ; Lauwers, A. ; Stolk, P. ; Maex, K.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.261-266,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765