1.

Technical Paper
Technical Paper
1. Computation of Segmented Arc-Heater Flows Considering Injection of Electrode Shield Gas
J. Lee ; G. Jeong ; J. Kim ; K. Kim
Pub. info.: AIAA meeting papers on disc.  2009.  Reston, Va..  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : Aerospace Sciences Meeting and Exhibit
Ser. no.: 2009
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
K. Seo ; S. Lee ; H. Kim ; D. Hwang ; S. Kim ; G. Jeong ; O. Han ; C. Chen ; D. Yee ; E. Kim ; K. Park ; N. Kim ; S. Choi ; D. Kim ; S. Lohokare
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
3.

Conference Proceedings
Conference Proceedings
3. The verification of printability about marginal defects and the detectability at the inspection tool in sub 50nm node
H. Lee ; G. Jeong ; K. Seo ; S. Kim ; C. Kim
Pub. info.: Photomask and next-generation lithography mask technology XV.  2  pp.70282V-1-70282V-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
4.

Conference Proceedings
Conference Proceedings
4. Preliminary verifiability of the aerial image measurement tool over photolithography process
H. Lee ; G. Jeong ; S. Kim ; O. Han
Pub. info.: Photomask technology 2007.  2  pp.67303A-1-67303A-10,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
5.

Conference Proceedings
Conference Proceedings
5. The study for close correlation of mask and wafer to optimize wafer field CD uniformity
M. Kim ; J. Kang ; S. Kang ; G. Jeong ; Y. Choi
Pub. info.: Photomask technology 2007.  3  pp.67304V-1-67304V-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
6.

Conference Proceedings
Conference Proceedings
6. The cleaning effects of mask aerial image after FIB repair in sub-80nm node
H. Lee ; G. Jeong ; S. Jeong ; S. Kim ; O. Han
Pub. info.: Photomask technology 2007.  2  pp.673022-1-673022-9,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
7.

Conference Proceedings
Conference Proceedings
7. Mask inspection method for 45nm node device
S. Oh ; Y. Choi ; D. Hwang ; G. Jeong ; O. Han
Pub. info.: Photomask technology 2007.  2  pp.673029-1-673029-9,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730