Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 results

Conference Proceedings

1. Novel x-ray analysis methods using a MicroStrip gas chamber

Ochi,A. ; Tanimori,T. ; Nishi,Y. ; Nagayoshi,T. ; Ohashi,Y. ; Uekusa,H. ; Toyokawa,H. ; Inoue,K. ; Fujisawa,T.

Pub. info.:	Detectors for crystallography and diffraction studies at synchrotron sources : 19 July 1999, Denver, Colorado. pp.76-86, 1999. Bellingham, Wash.: SPIE. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3774

Conference Proceedings

2. Effective exposure-dose measurement in optical microlithography

Inoue,S. ; Fujisawa,T. ; Izuha,K.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.810-818, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

3. Advanced mask technology for 230-mm reticle fabrication

Hiruta,K. ; Kubo,S. ; Iwamatsu,T. ; Fujisawa,T. ; Sugiyama,M. ; Morimoto,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.853-857, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Measurement of effective source shift using a grating-pinhole mask

Sato,K. ; Tanaka,S. ; Fujisawa,T. ; Inoue,S.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.99-107, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Evaluation of an advanced mask-writing system:II

Kvbo,S. ; Hiruta,K. ; Sugiyama,M. ; Iwamatsu,T. ; Fujisawa,T. ; Morimoto,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.532-541, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

6. Pressure Induced ｦ｣-Shallow - Deep Al Transition for Group VI:S,Se,and Group IV:Ge Donors in GaAs

Dmochowski,J.E. ; Stradling,R.A. ; Dunstan,D.J. ; Prins,A.D. ; Adams,A.R. ; Singer,K.E. ; Fujisawa,T. ; Kukimoto,H.

Pub. info.:	Proceedings of the 17th International Conference on Defects in Semiconductors : ICDS-17, Gmunden, Austria, July 18-23, 1993. Pt.2 pp.1075-1080, 1994. Zurich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	143-147

Conference Proceedings

7. Evaluation of loading effect of NLD dry etching: ？

Fujisawa,T. ; Iwamatsu,T. ; Hiruta,K. ; Morimoto,H. ; Harashima,N. ; Sasaki,T. ; Hara,M. ; Yamashiro,K. ; Ohkubo,Y. ; Takehana,Y.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.549-552, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

8. Improvement of NLD mask dry etching system

Fujisawa,T. ; Yoshioka,N. ; Sasaki,T. ; Yamashiro,K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.390-395, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

9. Proximity effect correction for reticle fabrication

Sugiyama,M. ; Kubo,S. ; Hiruta,K. ; Iwamatsu,T. ; Fujisawa,T. ; Morimoto,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.180-187, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

10.

Conference Proceedings

10. Evaluation of loading effect of NLD dry etching

Iwamatsu,T. ; Fujisawa,T. ; Hiruta,K. ; Morimoto,H. ; Harashima,N. ; sasaki,T. ; Hara,M. ; Yamashiro,K. ; Ohkubo,Y. ; Takehana,Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.235-242, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Select: Check all | Remove all

Sort order

10 results

Filtering by:

Author: Fujisawa,T.