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13 results

Conference Proceedings

1. SURFACE PREPARATION USING ANHYDROUS FLUORIDE AND AQUEOUS H2O PRIOR TO LOW TEMPERATURE EPITAXIAL SILICON DEPOSITION

Frystak, D.C. ; Wise, R. ; Grothe, P. ; Barnett, J. ; Fowler, B. ; Carpio, R.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.62-70, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

2. Investigation of Single-Wafer, Low Temperature Epitaxial Silicon Deposition with Clustered HF Pre- Clean

Wise, R. ; Frystak, D. ; Barnett, J. ; Grothe, P. ; Fowler, B. ; Forest, E.

Pub. info.:	Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition. pp.287-293, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-5

Conference Proceedings

3. A 0.18 μm CMOS Technology for Elevated Source/Drain MOSFETs Using Selective Silicon Epitaxy

Srivastava, A. ; Sun, J. ; Bellur, K. ; Bartholomew, R. ; O'Neil, P. ; Celik, M. ; Osburn, C.M. ; Masnari, N.A. ; OEztuerk, M.C. ; Westhoff, R. ; Fowler, B.

Pub. info.:	ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology. pp.571-586, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-3

Conference Proceedings

4. MODELINF OF SILICON DEPOSITION YIELD AT LOW TEMPERATURE BY ArF EXCIMER LASER PHOTOLYSIS OF DISILANE

Fowler, B. ; Lian, S. ; Krishnan, S. ; Li, C. ; Jung, L. ; Samara, D. ; Manna, I. ; Banerjee, S.

Pub. info.:	Mechanisms of Heteroepitaxial growth : symposium held April 27-30, 1992, San Francisco, California, U.S.A.. pp.203-208, 1992. Pittsburgh, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	263

Conference Proceedings

5. Modeling, Simulation and Control of Single Wafer Process in Cluster Tool Base on FT-IR-Line Sensor

Liu, Shaohua ; Solomon, Peter ; Carpio, R. ; Fowler, B. ; Simmons, D. ; Wang, J. ; Wise, R. ; Imper, G. ; Riley, N. B. ; Moslehi, M. ; Ravindra, N. M.

Pub. info.:	Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A.. pp.269-, 1995. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	389

Conference Proceedings

6. 1/f noise measurement in CMOS image sensors

Fowler, B. ; Mims, S. ; Frymire, B.

Pub. info.:	Digital photography : 17-18 January 2005, San Jose, California, USA. pp.25-33, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5678

Conference Proceedings

7. Color processing in camera phones: How good does it need to be?

Xiao, F. ; Zhang, X. ; Fowler, B.

Pub. info.:	Digital photography : 17-18 January 2005, San Jose, California, USA. pp.96-104, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5678

Conference Proceedings

8. SILICON HOMOEPITAXY AT 300°C USING ArF EXCIMER LASER PHOTOLYSIS OF DISILANE

Fowler, B. ; Lian, T. ; Bullock, D. ; Banerjee, S.

Pub. info.:	Surface chemistry and beam-solid interactions : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A.. pp.153-158, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	201

Conference Proceedings

9. ArF EXCIMER LASER-ENHANCED PHOTOCHEMICAL VAPOR DEPOSITION OF HOMOEPITAXIAL SILICON FROM DISILANE

Fowler, B. ; Lian, S. ; Krishnan, S. ; Jung, L. ; Banerjee, S.

Pub. info.:	Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A.. pp.323-328, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	224

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Conference Proceedings

10. A Comparison of Infrared Reflectance Spectroscopy and Spectroscopic Ellipsometry for Polysilicon Film Process Control

Carpio, R. ; Fowler, B. ; Simmons, D.G. ; Liu, S. ; Solomon, P.R.

Pub. info.:	Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices. pp.243-253, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-33

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