1.

Conference Proceedings
Conference Proceedings
1. Line-edge roughness in sub-0.18-ｦﾌm resist patterns
Palmateer,S.C. ; Cann,S.G. ; Curtin,J.E. ; Doran,S.P. ; Eriksen,L.M. ; Forte,A.R. ; Kunz,R.R. ; Lyszczarz,T.M. ; Stern,M.B. ; Nelson,C.M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.634-642,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Limits to etch resistance for 193-nm single-layer resists
Kunz,R.R. ; Palmateer,S.C. ; Forte,A.R. ; Allen,R.D. ; Wallraff,G.M. ; DiPietro,R.A. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.365-376,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
3.

Conference Proceedings
Conference Proceedings
3. 193-nm lithography
Rothschild,M. ; Forte,A.R. ; Horn,M.W. ; Kunz,R.R. ; Palmateer,S.C. ; Sedlacek,J.H.C.
Pub. info.: Lasers as tools for manufacturing of durable goods and microelectronics : 19 January-2 February, 1996, San Jose, California.  PartB  pp.398-404,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2703