1.

Conference Proceedings
Conference Proceedings
1. Mask availability for next-generation lithography
Lercel, M.J. ; Fisch, E. ; Racette, K.C. ; Lawliss, M. ; Williams, C. T. ; Kindt, L. ; Huang, C.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.18-22,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
2.

Conference Proceedings
Conference Proceedings
2. Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks
Thiel, C. ; Racette, K.C. ; Fisch, E. ; Lawliss, M. ; Kindt, L. ; Huang, C. ; Ackel, R. ; Levy, M.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.339-346,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Low-defect EUVI multilayers on standard-format mask blanks
Folta, J.A. ; Kearney, P.A. ; Larson, C.C. ; Crosley, M.K. ; Fisch, E. ; Racette, K.C.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.374-381,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Mask blanks and their (sometimes invisible) defects
Fisch, E. ; Racette, K.C. ; Folta, J.A. ; Larson, C.C.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1041-1047,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
Racette, K.C. ; Williams, C.T. ; Fisch, E. ; Kindt, L. ; Lawliss, M. ; Ackel, R. ; Lercel, M.J.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.161-172,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
6.

Conference Proceedings
Conference Proceedings
6. EUVL mask fabrication for the 45-nm node
Fisch, E. ; Kindt, L. ; Lercel, M.J. ; Racette, K.C. ; Williams, C.T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.865-871,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
7.

Conference Proceedings
Conference Proceedings
7. Chrome dry etching for 65-nm node mask manufacturing
Faure, T. ; Fisch, E. ; Huynh, C. ; Crawford, S.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.155-166,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
8.

Conference Proceedings
Conference Proceedings
8. Inspection of EUV reticles
Pettibone, D.W. ; Veldman, A. ; Liang, T. ; Stivers, A.R. ; Mangat, P.J. ; Lu, B. ; Hector, S.D. ; Wasson, J.R. ; Bleadel, K.L. ; Fisch, E. ; Walker, D.M.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.363-374,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
9.

Conference Proceedings
Conference Proceedings
9. EPL mask fabrication
Lercel, M.J. ; Williams, C.T. ; Lawliss, M. ; Ackel, R. ; Kindt, L. ; Fisch, E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.790-798,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754