1.

Conference Proceedings
Conference Proceedings
1. Approach to pattern aspect ratio control
Thomas,A.C. ; Zach,F.X. ; Wong,A.K. ; Ferguson,R.A. ; Samuels,D.J. ; Longo,R. ; Zhu,J. ; Feild,C.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.839-846,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Replication of optical components using a silicone rubber intermediate replica
Daly,D.J. ; Ferguson,R.A. ; Hutley,M.C.
Pub. info.: Micro-optical technologies for measurement, sensors, and microsystems II and Optical fiber sensor technologies and applications : 18-20 June 1997, Munich, FRG.  Part 1  pp.83-88,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3099
3.

Conference Proceedings
Conference Proceedings
3. Lithographic effects of mask critical dimension error
Wong,A.K. ; Ferguson,R.A. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Neisser,M.O.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.106-116,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
4.

Conference Proceedings
Conference Proceedings
4. Image shortening and process development in BEOL lithography
DellaGuardia,R. ; Warner,D.J. ; Chen,Z. ; Stetter,M. ; Ferguson,R.A. ; McGuire,A.E. ; Badger,K.D.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.952-961,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings
Conference Proceedings
5. Challenge of 1-Gb DRAM development when using optical lithography
Farrell,T.R. ; Nunes,R. ; Samuels,D.J. ; Thomas,A. ; Ferguson,R.A. ; Molless,A. ; Wong,A.K. ; Conley,W. ; Wheeler,D.C. ; Credendino,S. ; Naeem,M. ; Hoh,P. ; Lu,Z.
Pub. info.: Optical Microlithography X.  pp.333-341,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
6.

Conference Proceedings
Conference Proceedings
6. Characterization of linewidth variation on 248- and 193-nm exposure tools
Gabor,A.H. ; Brunner,T.A. ; Chen,J. ; Chen,N. ; Deshpande,S. ; Ferguson,R.A. ; Horak,D.V. ; Holmes,S.J. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Progler,C.J. ; Rabidoux,P.A. ; Ryan,D. ; Talvi,P. ; Tsou,L. ; Vampatella,B.R. ; Wong,A.K. ; Yang,Q. ; Yu,C.
Pub. info.: Optical Microlithography XIV.  4346  pp.259-264,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
7.

Conference Proceedings
Conference Proceedings
7. 193 lithography and RELACS processing for BEOL lithography
DellaGuardia,R. ; Petrillo,K.E. ; Chen,J. ; Rabidoux,P. ; Dalton,T.J. ; Holmes,S.J. ; Hadel,L.M. ; Malone,K. ; Mahorowala,A.P. ; Greco,S. ; Ferguson,R.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.1029-1040,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. When is bilayer thin-film imaging suitable: comparison with single-layer resists
Halle,S. ; Thomas,A.C. ; Armacost,M. ; Dalton,T.J. ; Chen,X.L. ; Bukofsky,S.J. ; Genz,O. ; Lu,Z.G. ; Butt,S.A. ; Chen,Z. ; Ferguson,R.A. ; Coker,E. ; Leidy,R.K. ; Lin,Q. ; Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Angelopoulos,M. ; Ignatowicz,M. ; Bui,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.970-981,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
9.

Conference Proceedings
Conference Proceedings
9. Method to determine printability of photomask defects and its use in phase-shift mask evaluations
Mansfield,S.M. ; Ferguson,R.A. ; Liebmann,L.W. ; Molless,A.F. ; Wong,A.K.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.651-660,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
10.

Conference Proceedings
Conference Proceedings
10. Approximate models for resist processing effects
Brunner,T.A. ; Ferguson,R.A.
Pub. info.: Optical Microlithography IX.  Part1  pp.198-207,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726