1.

Conference Proceedings
Conference Proceedings
1. New instrument to characterize materials and optics for 157-nm lithography
Boher,P. ; Evrard,P. ; Piel,J.-P. ; Stehle,J.-L.P.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.133-143,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm
Boher,P. ; Evrard,P. ; Piel,J.P. ; Stehle,J.L.
Pub. info.: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.30-40,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4449
3.

Conference Proceedings
Conference Proceedings
3. New versatile system for characterization of antireflective coatings using combined spectroscopic ellipsometry and grazing x-ray reflectance
Boher,P. ; Evrard,P. ; Stehle,J.L.P.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.104-114,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
4.

Conference Proceedings
Conference Proceedings
4. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm
Boher,P. ; Piel,J.P. ; Evrard,P. ; Defranoux,C. ; Espinosa,M. ; Stehle,J.L.P.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.379-389,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
5.

Conference Proceedings
Conference Proceedings
5. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm
Boher,P. ; Evrard,P. ; Piel,J.-P. ; Stehle,J.-L.P.
Pub. info.: Optical metrology roadmap for the semiconductor, optical, and data storage industries , 30-31 July 2000, San Diego, USA.  pp.206-217,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4099
6.

Conference Proceedings
Conference Proceedings
6. Combined metrology in cluding VUV spectroscopic ellipsometry and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm
Boher,P. ; Evrard,P. ; Piel,J.-P. ; Janicot,S. ; Stehle,J.-L.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.654-664,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
7.

Conference Proceedings
Conference Proceedings
7. Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool
Boher,P. ; Pickering,C. ; Tarnowka,A. ; Piel,J.-P. ; Evrard,P. ; Stehle,J.-L.P.
Pub. info.: Process Control and Diagnostics.  pp.115-123,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4182