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41 results

Conference Proceedings

1. Vibrational analysis of 200-mm EPL masks

Mikkelson,A.R. ; Chen,C. ; Engelstad,R.L. ; Lovell,E.G.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.383-391, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Dynamic characterization of step-induced vibrations of x-ray mask membranes

Schlax,M.P. ; Engelstad,R.L. ; Lovell,E.G.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.629-637, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

3. Natural Frequencies of Perforated Cylindrical Shells

Cousseau,P. ; Schlax,M. ; Engelstad,R.L. ; Lovell,E.G.

Pub. info.:	Proceedings of the 16th International Modal Analysis Conference February 2-5, 1998 Fess Parker's Doubletree Resort Santa Barbara, California. Part2 pp.1054-1060, 1998. Bethel, CT. Society for Experimental Mechanics
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3243

Conference Proceedings

4. Natural Frequencies of Plates with Uniform Perforations

Kaap,D.L. ; Lovell,E.G. ; Engelstad,R.L.

Pub. info.:	Proceedings of the 16th International Modal Analysis Conference February 2-5, 1998 Fess Parker's Doubletree Resort Santa Barbara, California. Part2 pp.1061-1067, 1998. Bethel, CT. Society for Experimental Mechanics
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3243

Conference Proceedings

5. Equivalent modeling of SCALPEL mask membrane distortion

Dicks,G.A. ; Engelstad,R.L. ; Lovell,E.G. ; Liddle,J.A.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.612-620, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

6. Analysis,design,and optimization of ion-beam lithography masks

Tejeda,R.O. ; Engelstad,R.L. ; Lovell,E.G. ; Berry,I.L.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.621-628, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

7. Pattern-specific emulation (PSE) for ion-beam projection lithography masks using finite element analysis

Fisher,A.H. ; Engelstad,R.L. ; Lovell,E.G.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.559-567, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

8. Mechanical distortions in advanced optical reticles

Mikkelson,A.R. ; Sprague,M.A. ; Engelstad,R.L. ; Lovell,F.G. ; Trost,D.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.601-611, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

9. Transient thermal distortions of x-ray mask membranes during exposure scanning

Feng,Z. ; Engelstad,R.L. ; Lovell,E.G. ; Cerrina,F.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.261-274, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

10.

Conference Proceedings

10. Mask requirements for advanced lithography

Trybula,W.J. ; Engelstad,R.L.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.226-235, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

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