1.

Conference Proceedings
Conference Proceedings
1. Advance of resist profile control in multilayer resist process for sub-150-nm lithography
Kimura,Y. ; Endo,H. ; Endo,A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.347-356,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. WD28 ｢｣ Exposing method of using photoresist mask for high-density optical disk mastering
Shimizu,A. ; Endo,H. ; Watanabe,H. ; Obara,T. ; Miyata,H. ; Mizuta,O. ; Takeuchi,K. ; Kudo,Y. ; Hashiguchi,T.
Pub. info.: ISOM/ODS '99 : joint international symposium on Optical Memory and Optical Data Strage 1999, 11-15 July 1999 Sheraton Kauai Resort, Koloa, Howaii.  Supplement  pp.440-442,  1999.  Bellingham, Washington.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3864
3.

Technical Paper
Technical Paper
3. Application of V2O5 Catalysts to Diesel Nox Emission Control
Sawata,A. ; Murakami,Y. ; Tsuru,Y. ; Tanoura,M. ; Endo,H.
Pub. info.: Emissions & fuels.  pp.35-38,  2001.  Warrendale, Pa..  Society of Automotive Engineering, Inc.
Title of ser.: SAE publication
Ser. no.: P-373
4.

Conference Proceedings
Conference Proceedings
4. Hierarchical proximity correction using CAPROX
Hofmann,U. ; Kalus,C.K. ; Rosenbusch,A. ; Endo,H. ; Kimura,Y. ; Endo,A.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.558-567,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
5.

Conference Proceedings
Conference Proceedings
5. On the way to 1 Gb: demonstration of e-beam proximity effect correction for mask making
Rosenbusch,A. ; Kalus,C.K. ; Endo,H. ; Kimura,Y. ; Endo,A.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.312-318,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236