1.

Conference Proceedings
Conference Proceedings
1. 193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
Amblard,G.R. ; Byers,J.D. ; Domke,W.D. ; Rich,G.K. ; Graffenberg,V.L. ; Patel,S. ; Miller,D.A. ; Perez,G.B.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.32-53,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Pattern collapse in high-aspect-ratio DUV and 193-nm resists
Domke,W.D. ; Graffenberg,V.L. ; Patel,S. ; Rich,G.K. ; Cao,H.B. ; Nealey,P.F.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.313-321,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999